TY  - BOOK
AU  - Guilei Wang
TI  - Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
SN  - 9789811500466
PY  - 2019///
PB  - Springer Nature Singapore
KW  - Physics and Astronomy
UR  - https://doi.org/10.1007/978-981-15-0046-6
ER  -