Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond (Record no. 18528)

000 -LEADER
fixed length control field 00501nam a2200145Ia 4500
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 230130s9999||||xx |||||||||||||| ||und||
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9789811500466
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Guilei Wang
245 #0 - TITLE STATEMENT
Title Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
250 ## - EDITION STATEMENT
Edition statement 1st ed. 2019
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Name of publisher, distributor, etc. Springer Nature Singapore
Date of publication, distribution, etc. 2019
440 ## - SERIES STATEMENT/ADDED ENTRY--TITLE
Title Springer Theses
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Physics and Astronomy
856 ## - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://doi.org/10.1007/978-981-15-0046-6">https://doi.org/10.1007/978-981-15-0046-6</a>
Holdings
Withdrawn status Lost status Damaged status Not for loan Home library Current library Date acquired Barcode Date last seen Uniform Resource Identifier Price effective from Koha item type
      Accessible Online ICTS ICTS 01/30/2023 EBK15293 01/30/2023 https://doi.org/10.1007/978-981-15-0046-6 01/30/2023 electronic book