Guilei Wang
Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - 1st ed. 2019 - Springer Nature Singapore 2019 - Springer Theses .
9789811500466
Physics and Astronomy
Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - 1st ed. 2019 - Springer Nature Singapore 2019 - Springer Theses .
9789811500466
Physics and Astronomy